IEEE - Institute of Electrical and Electronics Engineers, Inc. - E-beam writing: a next-generation lithography approach for thin-film head critical features

Author(s): R.E. Fontana ; J. Katine ; M. Rooks ; R. Viswanathan ; J. Lille ; S. MacDonald ; E. Kratschmer ; C. Tsang ; S. Nguyen ; N. Robertson ; P. Kasiraj
Sponsor(s): IEEE Magnetics Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 2002
Volume: 38
Page Count: 6
Page(s): 95 - 100
ISSN (Paper): 0018-9464
ISSN (Online): 1941-0069
DOI: 10.1109/TMAG.2002.988918
Regular:

Magnetic recording areal densities using magnetoresistive (MR) head technology are increasing at annual rates in excess of 60% per year and in some applications as great as 100% per year. Today,... View More

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