IEEE - Institute of Electrical and Electronics Engineers, Inc. - A new look at the antenna effect

Author(s): D.P. Verret ; A. Krishnan ; S. Krishnan
Sponsor(s): IEEE Electron Devices Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 July 2002
Volume: 49
Page Count: 9
Page(s): 1,274 - 1,282
ISSN (Paper): 0018-9383
ISSN (Online): 1557-9646
DOI: 10.1109/TED.2002.1013286
Regular:

It is a widely held belief that plasma process-induced damage (PID) is caused, among other things, by plasma nonuniformities. These nonuniformities are caused by either nonoptimum reactor design... View More

Advertisement