IEEE - Institute of Electrical and Electronics Engineers, Inc. - A neural-network-based approach to determining a robust process recipe for the plasma-enhanced deposition of silicon nitride thin films

Author(s): I.G. Rosen ; T. Parent ; C. Cooper ; P. Chen ; A. Madhukar
Sponsor(s): IEEE Control Systems Society
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 March 2001
Volume: 9
Page Count: 14
Page(s): 271 - 284
ISSN (Paper): 1063-6536
ISSN (Online): 1558-0865
DOI: 10.1109/87.911379
Regular:

We consider the problem of locating a process recipe that produces outputs which are, in some sense, least sensitive to small fluctuations in the process condition. Specifically, we determine the... View More

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