IEEE - Institute of Electrical and Electronics Engineers, Inc. - Rapid development, in a manufacturing environment, of a 1 mu m triple-level metal CMOS process through the use of cross-functional teams

Author(s): Comard, M. ; Cuellar, J.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1992
Conference Location: Cambridge, MA, USA, USA
Conference Date: 30 September 1992
Page(s): 180 - 185
ISBN (Paper): 0-7803-0740-2
DOI: 10.1109/ASMC.1992.253797
Regular:

The development, in a manufacturing environment, of a 1 mu m triple-level-metal, 5 V CMOS process in under 25 weeks is discussed. The manufacturing process engineering group developed... View More

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