IEEE - Institute of Electrical and Electronics Engineers, Inc. - Profile control in isotropic plasma etching

Author(s): Zhu, H. ; Lindquist, R.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1992
Conference Location: Cambridge, MA, USA, USA
Conference Date: 30 September 1992
Page(s): 116 - 119
ISBN (Paper): 0-7803-0740-2
DOI: 10.1109/ASMC.1992.253786
Regular:

The possibility of controlling the lateral-to-vertical etch ratio of undoped dielectric material is tested. The Lam Research Rainbow 4500i, configured with a downstream isotropic plasma etch... View More

Advertisement