IEEE - Institute of Electrical and Electronics Engineers, Inc. - Lithographic manufacturing techniques for wafer scale integration

Author(s): Flack, W.W. ; Flores, G.E.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1992
Conference Location: San Francisco, CA, USA
Conference Date: 22 January 1992
Page(s): 4 - 13
ISBN (Paper): 0-8186-2482-5
DOI: 10.1109/ICWSI.1992.171790
Regular:

A methodology utilizing a mix-and-match approach of optical 1*lithography and e-beam lithography currently used at TRW for WSI (wafer scale integration) technologies is discussed. Field stitching... View More

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