IEEE - Institute of Electrical and Electronics Engineers, Inc. - A general model for PVD aluminum deposition

Author(s): Cale, T.S. ; Gandy, T.H. ; Jain, M.k. ; Ramaswami, M. ; Raupp, G.B.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1991
Conference Location: Santa Clara, CA, USA, USA
Conference Date: 11 June 1991
Page(s): 350 - 352
ISBN (Paper): 0-87942-673-X
DOI: 10.1109/VMIC.1991.153022
Regular:

A model for free molecular transport, surface diffusion and heterogeneous reactions in features during low pressure deposition processes is specialized to simulate film profile evolution during... View More

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