IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication technologies for dual 4-kbit stacked SRAM

Author(s): Yamazaki, K. ; Yoneda, M. ; Ogawa, S. ; Ueda, M. ; Akiyama, S. ; Terui, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 January 1986
Conference Location: Los Angeles, CA, USA, USA
Conference Date: 7 December 1986
Page(s): 435 - 438
DOI: 10.1109/IEDM.1986.191212
Regular:

The process technologies for realizing a 3-D LSI are reported with emphasizing the high quality laser recrystallization and the thermally stable interconnects. A homogeneous recrystallization of... View More

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