IEEE - Institute of Electrical and Electronics Engineers, Inc. - Tungsten Photochemical Vapor Deposition for VLSI Application and its Reaction Mechanism

Author(s): Itoh, Hitoshi ; Moriya, Takahiko ; Toyama, Masaharu
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 1986
Conference Location: San Diego, CA, USA, USA
Conference Date: 28 May 1986
Page(s): 57 - 58
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