IEEE - Institute of Electrical and Electronics Engineers, Inc. - Fabrication Technologies for Multilayer CMOS Device

Author(s): Akiyama, S. ; Yoneda, M. ; Ogawa, S. ; Yoshii, N. ; Terui, Y.
Publisher: IEEE - Institute of Electrical and Electronics Engineers, Inc.
Publication Date: 1 May 1985
Conference Location: Kobe, Japan, Japan
Conference Date: 14 May 1985
Page(s): 28 - 29
ISBN (Paper): 4-930813-09-3
Regular:

Fundamental technologies required to fabricate a multilayer device were studied. Dual laser beam recrystallization method was developed to obtain homogeneous crystal quality Si islands through 5... View More

Advertisement